Ion beam assisted deposition: A molecular dynamics simulation

Materials and Manufacturing Processes

Volumn 12, Issue 3, 1997, Pages 529-539

  Fedotov, Serguei A ^a   Efimchik, Andrey A ^a   Byeli, Alexey V ^a  

^a Physico Technical Institute   (Belarus)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; ION BEAMS; MOLECULAR DYNAMICS; REACTION KINETICS;

CARBON FILMS; ION BEAM ASSISTED DEPOSITION (IBAD); TERSOFF POTENTIAL;

CARBON;

EID: 0031146758     PISSN: 10426914     EISSN: None     Source Type: Journal    
DOI: 10.1080/10426919708935162     Document Type: Article

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