Intensification of optical electric fields caused by the interaction with a metal tip in photofield emission and laser-assisted scanning tunneling microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 3, 1997, Pages 597-601

  Hagmann, Mark J ^a  

^a The Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; ELECTRIC CURRENT MEASUREMENT; ELECTRIC FIELDS; LASER APPLICATIONS; LASER BEAM EFFECTS; LIGHT EMISSION; OPTICAL VARIABLES MEASUREMENT;

ELECTRIC FLUX DENSITY; INCIDENT LASER BEAM; OPTICAL ELECTRIC FIELDS; PHOTOFIELD EMISSION;

SCANNING TUNNELING MICROSCOPY;

EID: 0031145294     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589298     Document Type: Article

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