A two-step electrochemical etch-stop to produce freestanding bulk-micromachined structures

Sensors and Actuators, A: Physical

Volumn 60, Issue 1-3, 1997, Pages 103-107

  Eichner, Dierk ^a   Von Münch, Waldemar ^a,b,c  

^a UNIVERSITY OF STUTTGART   (Germany)

^b Deutsche Bundespost   (Germany)

^c IBM   (Germany)

Author keywords

Bulk micromachining; Electrochemical etch stop; Resonance measurements

Indexed keywords

COMPOSITE MICROMECHANICS; COPOLYMERS; ETCHING; LASER APPLICATIONS; MICROMACHINING; POTASSIUM COMPOUNDS; RESONANCE; SILICON WAFERS; SOLUTIONS; THIN FILMS;

ANISOTROPIC ETCHING; BULK MICROMACHINING; ELECTROCHEMICAL ETCH STOP; LASER VIBROMETER; POTASSIUM HYDROXIDE; WET CHEMICAL ETCHING;

SILICON SENSORS;

EID: 0031144260     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01358-7     Document Type: Article

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