Rayleigh scattering and fictive temperature in VAD silica glass with heat treatment

Journal of the Ceramic Society of Japan

Volumn 105, Issue 5, 1997, Pages 377-380

  Todoroki, Shin Ichi ^a   Sakaguchi, Shigeki ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Fictive temperature; Rayleigh scattering; Silica glass; Structural relaxation

Indexed keywords

ANNEALING; DEHYDRATION; INFRARED SPECTROSCOPY; MOLECULAR VIBRATIONS; RAYLEIGH SCATTERING; REFRACTIVE INDEX; RELAXATION PROCESSES; THERMAL EFFECTS; VAPOR DEPOSITION;

FICTIVE TEMPERATURE; VAPOR PHASE AXIAL DEPOSITION;

FUSED SILICA;

EID: 0031143843     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.105.377     Document Type: Article

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