Optimized grating formation for optoelectronic devices

Journal of the Electrochemical Society

Volumn 144, Issue 5, 1997, Pages 1760-1764

  Han, Sang Kook ^a   Choi, Bo Hun ^b  

^a Yonsei University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HOLOGRAPHY; LITHOGRAPHY; SEMICONDUCTING INDIUM PHOSPHIDE;

CHEMICAL ETCHING; GRATINGS; HOLOGRAPHIC LITHOGRAPHY;

OPTOELECTRONIC DEVICES;

EID: 0031142857     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837675     Document Type: Article

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