Development of CH4-radio-frequency-plasma-enhanced chemical vapor deposition method with a positively self-biased electrode for diamond-like carbon film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 5 A, 1997, Pages 2817-2821

  Inaba, Hiroshi ^a   Kokaku, Yuuichi ^a   Terakado, Masatomo ^a   Kataoka, Hiroyuki ^a  

^a HITACHI LTD   (Japan)

Author keywords

Deposition rate; Diamond like carbon; Magnetic recording disk; Plasma; Pure methane gas; Radio frequency CVD; Uniform film thickness

Indexed keywords

DIAMOND-LIKE CARBON FILMS; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; RADIOFREQUENCY CHEMICAL VAPOR DEPOSITION; SELF-BIASED ELECTRODES;

ANODES; CAPACITANCE; CARBON; CATHODES; MAGNETIC DISK STORAGE; MAGNETIC THIN FILMS; METHANE; PLASMA APPLICATIONS; PLASMA SHEATHS; SUBSTRATES;

CHEMICAL VAPOR DEPOSITION;

EID: 0031142684     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.2817     Document Type: Article

References (6)

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