Dependence of photoemission efficiency on the pulsed laser cleaning of Tungsten photocathodes, part 1: Experimental

Applied Physics A: Materials Science and Processing

Volumn 64, Issue 5, 1997, Pages 467-471

  Tomas, C ^a   Girardeau Montaut, J P ^a   Afif, M ^a   Romand, M ^a   Charbonnier, M ^a   Duc, T M ^a  

^a UNIVERSITÉ LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; ELECTRIC CURRENTS; ELECTRONS; LASER PULSES; PHOTOEMISSION; POLYCRYSTALLINE MATERIALS; PRESSURE; PULSED LASER APPLICATIONS; SURFACES; TUNGSTEN;

PHOTOCURRENT; PHOTOEMISSION EFFICIENCY; PICOSECOND; PULSED LASER CLEANING; RESIDUAL PRESSURE; WORK FUNCTION;

PHOTOCATHODES;

EID: 0031142448     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050503     Document Type: Article

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