Two-dimensional simulation of compact ECR plasma sources

Plasma Sources Science and Technology

Volumn 6, Issue 2, 1997, Pages 231-239

  Wu, Han Ming ^a   Graves, David B ^b   Kilgore, Mike ^c  

^a CFD RESEARCH CORPORATION   (United States)

^b University of California   (United States)

^c NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRON CYCLOTRON RESONANCE; IONIZATION OF GASES; MATHEMATICAL MODELS; MONTE CARLO METHODS; PLASMA DENSITY; PLASMA DEVICES; PLASMA SIMULATION; PRESSURE EFFECTS;

NEUTRAL GAS DEPLETION EFFECTS; PLASMA REACTORS;

PLASMA SOURCES;

EID: 0031141133     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/2/017     Document Type: Article

References (30)

1. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
2. Singer P H 1991 Semicond. Int. July 46
3. Asmusser J 1989 J. Vac. Sci. Technol. A 7 883
4. Gorbakin S M, Berry L A and Roberto J B 1990 J. Vac. Sci. Technol. A 8 2983
5. Cecchi J L, Stevens J E, Jarecki R L Jr and Huang Y C 1991 J. Vac. Sci. Technol. B 9 318
6. Holber W and Forster J 1990 J. Vac. Sci. Technol. A 8 3720
7. Stewart R A, Qian X Y, Carl D A, Lake B Jr, Benasso J, Lynch R, Pico C A, Lieberman M A and Cheung N W 1990 Memorandum UCB/ERL M90/100, p 12
8. Den Hartog E A, Persing H and Claude Woods R 1991 Appl. Phys. Lett. 57 661
9. Sadeghi N, Nakano T, Fravor D J and Gottscho R A 1991 J. Appl. Phys. 70 2552
10. Nakano T, Sadeghi N and Gottscho R A 1991 Appl. Phys. Lett. 58 458
11. Claude Woods R, McClain R L, Mahoney L J, Den Hartog E A, Persing H and Hamers J S 1991 Proc. Module Metrology, Control and Clustering p 366
12. Nakano T, Sadeghi N, Travor D J, Gottscho R A and Boswell R W 1992 J. Appl. Phys. 72 3384
13. Hussein M A and Emmert G A 1990 J. Vac. Sci. Technol. A 8 2913
14. Weng Y and Kushner M J 1992 J. Appl. Phys.
15. Hussein M A, Emmert G A, Hershkowitz N and Claude Woods R 1992 J. Appl. Phys. 72 1720
16. Porteous R K, Wu H-M and Graves D B 1994 Plasma Sources Sci. Technol. 3 25
17. Porteous R K and Graves D B 1991 IEEE Trans. Plasma Science PS-19 205
18. Graves D B, Wu H-M and Porteous R K 1993 Japan. J. Appl. Phys. 32 2999
19. Wu H-M, Graves D B and Porteous R K 1995 Plasma Sources Sci. Technol. 4 22
20. Kilgore M, Wu H-M and Graves D B 1994 J. Vac. Sci. Technol. B 12 494
21. Rapp D and Golden P E 1965 J. Chem. Phys. 43 1464
22. de Heer F J, Jansen R H J and van der Kaay W 1979 J. Phys. B: At. Mol. Phys. 12 979
23. Birdsall C K and Langdon A B 1985 Plasma Physics via Computer Simulation (New York: McGraw-Hill)
24. Surendra M 1991 PhD Thesis Department of Chemical Engineering, University of California at Berkeley
25. Golant V E, Zhilinsky A P, Sakharov I E and Brown S C 1980 Fundamentals of Plasma Physics (New York: Wiley)
26. Bird G A 1976 Molecular Gas Dynamics (Oxford: Clarendon)
27. Boschi A and Magistrelli F 1963 Nuovo Cimento 29 487
28. Godyak V A and Sternberg N 1990 Phys. Rev. A 42 2299
29. Jurgensen C W 1988 J. Appl. Phys. 64 590
30. Parker S E, Procassini R J and Birdsall C K 1993 J. Comput. Phys. 104 41