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Volumn 18, Issue 5, 1997, Pages 200-202

Experimental determination of electron and hole mobilities in MOS accumulation layers

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; IMPURITIES; SEMICONDUCTOR DOPING;

EID: 0031140948     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.568762     Document Type: Article
Times cited : (15)

References (12)
  • 1
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • Aug.
    • S. C. Sun and J. D. Plummer, "Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces," IEEE Trans. Electron Devices, vol. ED-27, pp. 1497-1508, Aug. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 2
    • 0012998753 scopus 로고
    • Hole mobility in p-type silicon accumulation layers
    • S. Manzini and A. Modelli, "Hole mobility in p-type silicon accumulation layers," J. Appl. Phys., vol. 65, no. 6, pp. 2361-2370, 1989.
    • (1989) J. Appl. Phys. , vol.65 , Issue.6 , pp. 2361-2370
    • Manzini, S.1    Modelli, A.2
  • 6
    • 0018683243 scopus 로고
    • Characterization of the electron mobility in the inverted (100) silicon surface
    • A. G. Sabnis and J. T. Clemens, "Characterization of the electron mobility in the inverted (100) silicon surface," in IEEE IEDM Tech. Dig., 1979. pp. 18-21.
    • (1979) IEEE IEDM Tech. Dig. , pp. 18-21
    • Sabnis, A.G.1    Clemens, J.T.2
  • 9
  • 10
    • 0024178927 scopus 로고
    • On the universality of inversionlayer mobility in n- and p-channel MOSFET's
    • S. Takagi, M. Iwase, and A. Toriumi, "On the universality of inversionlayer mobility in n- and p-channel MOSFET's," in IEEE IEDM Tech. Dig.. 1988, p. 398.
    • (1988) IEEE IEDM Tech. Dig. , pp. 398
    • Takagi, S.1    Iwase, M.2    Toriumi, A.3
  • 11
    • 0015435241 scopus 로고
    • Diffusion of boron from shallow ion implants in silicon
    • S. Wagner, "Diffusion of boron from shallow ion implants in silicon," J. Etectrochem. Soc., vol. 119, pp. 1570, 1972.
    • (1972) J. Etectrochem. Soc. , vol.119 , pp. 1570
    • Wagner, S.1
  • 12
    • 0020783138 scopus 로고
    • Modeling of carrier mobility against carrier concentration in arsenic-, phosphorus-, and boron-doped silicon
    • July
    • G. Masetti, M. Severi, and S. Solmi, "Modeling of carrier mobility against carrier concentration in arsenic-, phosphorus-, and boron-doped silicon," IEEE Trans. Electron Devices, vol. ED-30, pp. 764-769, July 1983.
    • (1983) IEEE Trans. Electron Devices , vol.ED-30 , pp. 764-769
    • Masetti, G.1    Severi, M.2    Solmi, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.