Formation of ternary (Fe1-xCox) Si2 structures by ion beam assisted deposition and ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 124, Issue 4, 1997, Pages 533-541

  Wieser, E ^a   Panknin, D ^a   Barradas, N P ^a   Betzl, M ^a   Reuther, H ^a   Henrion, W ^b   Lange, H ^b  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; AUGER ELECTRON SPECTROSCOPY; COBALT; DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; ENERGY GAP; INFRARED SPECTROSCOPY; ION IMPLANTATION; PHASE TRANSITIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION;

ION BEAM ASSISTED DEPOSITION; IRON COBALT SILICIDE; IRON SILICIDE; SPUTTER DEPTH PROFILING;

IRON ALLOYS;

EID: 0031140135     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00126-2     Document Type: Article

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