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Journal of the Electrochemical Society

Volumn 144, Issue 5, 1997, Pages 1842-1849

Rapid thermal processing: Fixing problems with the concept of thermal budget

(2) Ditchfield, R a Seebauer, E G a

a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

RAPID THERMAL PROCESSING;

CHEMICAL VAPOR DEPOSITION;

EID: 0031139376 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1837688 Document Type: Article

Times cited : (14)

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