Gas permeation through CVD modified anodic alumina membrane

Journal of Chemical Engineering of Japan

Volumn 30, Issue 2, 1997, Pages 359-362

  Onuki, Kaoru ^a   Nakajima, Hayato ^a   Shimizu, Saburo ^a   Nagoshi, Masayasu ^b  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b NONE

Author keywords

Anodic Alumina; Chemical Vapor Deposition; Gas Permeation; Inorganic Membrane; Tetraethylorthosilicate

Indexed keywords

CARBON; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; DIFFUSION; GAS PERMEABLE MEMBRANES; HELIUM; HYDROGEN; POROUS MATERIALS; SILICATES; SILICON COMPOUNDS; SUBSTRATES; THERMAL EFFECTS;

ANODIC ALUMINA MEMBRANE; GAS PERMEATION; PERMSELECTIVITY; SILICON OXIDE; TETRAETHYLORTHOSILICATE;

ALUMINA;

ALUMINA; GAS PERMEATION; MEMBRANES-CERAMIC;

EID: 0031126618     PISSN: 00219592     EISSN: None     Source Type: Journal    
DOI: 10.1252/jcej.30.359     Document Type: Article

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