Reflected electron energy-loss microscopy and scanning auger microscopy study of semiconductor surfaces

Surface and Interface Analysis

Volumn 25, Issue 4, 1997, Pages 235-244

  Paparazzo, E ^a  

^a CNR   (Italy)

Author keywords

AES; EELS; Microanalysis; Semiconductors

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON ENERGY LOSS SPECTROSCOPY; ETCHING; MICROANALYSIS; SEMICONDUCTING FILMS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON;

REFLECTED ELECTRON ENERGY LOSS MICROSCOPY (REELM); SCANNING AUGER MICROSCOPY (SAM); SURFACE PLASMON;

SURFACES;

EID: 0031125281     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199704)25:4<235::AID-SIA231>3.0.CO;2-H     Document Type: Article

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