A study of the chemical composition of the passive film on a Ti-Mo alloy in HCI and H2SO4

Journal of Materials Engineering and Performance

Volumn 6, Issue 2, 1997, Pages 199-202

  Wang, G ^a   Wang, H ^a   Liu, X ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

Passive film; Ti Mo alloy; XPS

Indexed keywords

ANODIC POLARIZATION; ELECTROCHEMISTRY; ELECTROLYTES; FILMS; HYDROCHLORIC ACID; ION BOMBARDMENT; PASSIVATION; SPUTTERING; SULFURIC ACID; X RAY PHOTOELECTRON SPECTROSCOPY;

ANODIC POLARIZATION POTENTIALS; PASSIVE FILMS;

MOLYBDENUM ALLOYS;

EID: 0031125126     PISSN: 10599495     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11665-997-0014-3     Document Type: Article

References (10)

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