A simple modification of the magnetron sputtering method for the deposition of boron-doped hydrogenated microcrystalline silicon films with enhanced doping efficiency

Thin Solid Films

Volumn 298, Issue 1-2, 1997, Pages 200-210

  Sharma, S N ^a   Das, Debabrata ^a   Banerjee, Ratnabali ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

Amorphous materials; Silicon; Sputtering; Structural properties

Indexed keywords

BORON; CHEMICAL MODIFICATION; CONDUCTIVE FILMS; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); FILM PREPARATION; HYDROGENATION; MAGNETRON SPUTTERING; MAGNETS; SILICON; SPUTTER DEPOSITION;

HYDROGENATED MICROCRYSTALLINE SILICON FILMS;

AMORPHOUS FILMS;

EID: 0031125093     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09325-X     Document Type: Article

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