Investigation of the electric-field distribution at the subwavelength aperture of a near-field scanning optical microscope

Applied Physics Letters

Volumn 70, Issue 15, 1997, Pages 1932-1934

  Decca, R S ^a   Drew, H D ^a   Empson, K L ^a  

^a LABORATORY FOR PHYSICAL SCIENCES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; ELECTROSTATICS; FINITE ELEMENT METHOD; PERMITTIVITY; REFRACTIVE INDEX; SCANNING;

ELECTRIC FIELD DISTRIBUTION; NEAR FIELD SCANNING OPTICAL MICROSCOPE; REFLECTIVITY; SUBWAVELENGTH APERTURE; TOPOGRAPHY;

OPTICAL MICROSCOPY;

EID: 0031124780     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118783     Document Type: Article

References (9)

1. L. Novotny, D. W. Pohl, and B. Hecht, Opt. Lett. 20, 970 (1995), and references therein.
2. H. A. Bethe, Phys. Rev. 66, 163 (1944); C. J. Boukamp, Philips. Res. Rep. 5, 321 (1950).
3. H. A. Bethe, Phys. Rev. 66, 163 (1944); C. J. Boukamp, Philips. Res. Rep. 5, 321 (1950).
4. E. Betzig and R. Chichester, Science 262, 1422 (1993).
5. R. Decca, H. D. Drew, and K. L. Empson, Rev. Sci. Instrum. 68, 1291 (1997).
6. R. D. Grober, T. Rutherford, and T. D. Harris, Appl. Opt. 35, 3488 (1996).
7. E. M. Purcell and C. R. Pennypacker, Astrophys. J. 186, 705 (1973).
8. J. D. Jackson, Classical Electrodynamics, 2nd ed. (Wiley, New York, 1975).
9. R. S. Decca and H. D. Drew (unpublished).