|
Volumn 13, Issue 4-5, 1997, Pages 20-
|
Lithography for FED production
|
Author keywords
[No Author keywords available]
|
Indexed keywords
AMORPHOUS FILMS;
ANODES;
COST EFFECTIVENESS;
ELECTRONIC EQUIPMENT MANUFACTURE;
FIELD EMISSION CATHODES;
HOLOGRAPHY;
LASER BEAMS;
LITHOGRAPHY;
MASKS;
PHOTORESISTS;
REACTIVE ION ETCHING;
SUBSTRATES;
FIELD EMISSION DISPLAYS;
HOLOGRAPHIC LITHOGRAPHY;
LASER INTERFERENCE LITHOGRAPHY;
SPINDT CATHODE;
DISPLAY DEVICES;
|
EID: 0031124653
PISSN: 03620972
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (4)
|
References (0)
|