CAD tools for bridging microsystems and foundries

IEEE Design and Test of Computers

Volumn 14, Issue 2, 1997, Pages 34-39

  Karam, Jean Michel ^a,b,c,d,e,i   Courtois, Bernard ^a,b,e,f   Boutamine, Hicham ^a,g,h  

^a TIMA LABORATORY   (France)

^b GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^c Universite Paris 1   (France)

^d Ecl Sup d'Ing Electrotechnique E   (France)

^e Ecl Sup d'Ing de Beyrouth ^*

^f CMP   (France)

^g Universite Mentouri Constantine   (Algeria)

^h UNIV MONTPELLIER   (France)

ⁱ CMP Service   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER HARDWARE DESCRIPTION LANGUAGES; COMPUTER SIMULATION; ETCHING; FINITE ELEMENT METHOD; MICROELECTROMECHANICAL DEVICES; MICROELECTRONIC PROCESSING; SILICON WAFERS; SIMULATORS; SYSTEMS ANALYSIS;

DESIGN RULE CHECKER; ETCHING SIMULATOR; MICROSYSTEM ENGINEERING KIT;

COMPUTER AIDED DESIGN;

EID: 0031124517     PISSN: 07407475     EISSN: None     Source Type: Journal    
DOI: 10.1109/54.587739     Document Type: Article

References (8)

1. A. Poppe et al., "A General CAD Concept and Design Framework Architecture for Integrated Microsystems," Proc. MicroSIM 95, Computational Mechanics, Boston, 1995, pp. 259-271.
2. J.M. Karam and B. Courtois, "From the MEMS Idea to the MEMS Product: CAD and Foundries," Proc. Wescon 96, IEEE, Piscataway, N.J., 1996, pp. 73-78.
3. One- and Two-Dimensional Process Simulator for Oxidation, Diffusion, Deposition, Etching, and Ion Implantation, user guide, Technology Modeling Associates, Palo Alto, Calif., and Silvaco Data Systems, Santa Clara, Calif.
4. Modeling of Semiconductor Technology, Devices and Systems, user guide, Integrated Systems Eng., Zürich.
5. R. Buser, "ASEP: A CAD Program for Silicon Anisotropic Etching," Sensors and Actuators A, Vol. 28, 1991, pp. 71-78.
6. J. Frühauf et al., "A Simulation Tool for the Orientation Dependent Etching," J. Micromechanical Microengineering, No. 3, 1993, pp. 113-115.
7. AnisE, tech. manual, IntelliSense Corp., Wilmington, Mass.
8. O. Than and S. Buttgenbach, "Simulation of Anisotropic Chemical Etching of Crystalline Silicon Using a Cellular Automata Model," Sensors and Actuators A, Vol. 45, 1994, pp. 885-889.