Deposition of diamondlike carbon films by plasma enhanced chemical vapour deposition

Materials Science and Engineering B

Volumn 46, Issue 1-3, 1997, Pages 133-136

  Choi, Seong S ^a   Kim, D W ^a   Joe, J W ^b   Moon, J H ^c   Park, K C ^c   Jang, J ^c  

^a SunMoon University   (South Korea)

^b Kangwon National University   (South Korea)

^c Kyung Hee University   (South Korea)

Author keywords

Etching period; Optical bandgap; Plasma

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; ENERGY GAP; ETCHING; HARDNESS; HELIUM; HYDROGEN; METHANE; PLASMA APPLICATIONS;

REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD);

DIAMOND FILMS;

EID: 0031124447     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01948-4     Document Type: Article

References (9)

1. W.A. Yarbrough and R. Messier, Science, 247 (1990) 688.
2. N. Mutsukura, S. Inoue and Y. Machi, J. Appl. Phys., 72 (1992) 43.
3. L.H. Chou, J. Appl. Phys., 72 (1992) 2027.
4. A. Bubenzer, B. Dischler, G. Grandt and P. Koidal, J. Appl. Phys., 54 (1988) 4590.
5. L. Abello, G. Lucazeau, B. Andre and Th. Priem, Diamond and Related materials, Elsevier Science, 1990, pp. 512-518.
6. M. Ramstiener and J. Wagner, Appl. Phys. Lett., 51 (17) (1987) 1355.
7. M. Frenklach in R.E. Clausing, L.L. Horton, J.C. Angus and P. Koidl (eds.), Diamond and Diamond-like Films and Coatings, NATO ASISeries 1990; B: Physics, Vol. 266, Plenum Press, New York, pp. 499-524.
8. J. Roberston and E.P. O'Reiilly, Phys. Rev. B, 35 (1987) 2946.
9. J.C. Angus and C.C. Hayman, Science, 241 (1988) 941.