Large area deposition of YBCO thick films for applications in resistive fault current limiting devices

Journal of Alloys and Compounds

Volumn 251, Issue 1-2, 1997, Pages 366-372

  Neumuller H W ^a   Schmidt, W ^a   Kinder, H ^b   Freyhardt, H C ^c   Stritzker, B ^d   Wordenweber R ^e   Kirchhoff, V ^f  

^a SIEMENS AG   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c UNIVERSITY OF GÖTTINGEN   (Germany)

^d UNIVERSITY OF AUGSBURG   (Germany)

^e FORSCHUNGSZENTRUM JÜLICH   (Germany)

^f Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Large area deposition; Magnetron sputtering; Pulsed laser deposition; Resistive fault current limiter; Superconducting thick films; Superconductivity in power engineering; Thermal co evaporation

Indexed keywords

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); EVAPORATION; ION BEAMS; LIMITERS; MAGNETRON SPUTTERING; OXIDE SUPERCONDUCTORS; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; SINGLE CRYSTALS; SUBSTRATES; YTTRIUM COMPOUNDS;

ION BEAM ASSISTED DEPOSITION; PLASMA FLASH EVAPORATION; PULSED LASER DEPOSITION; THERMAL EVAPORATION; YTTRIUM BARIUM COPPER OXIDE;

SUPERCONDUCTING FILMS;

EID: 0031123144     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(96)02691-6     Document Type: Article

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