Deposition uniformity, particle nucleation, and the optimum conditions for chemical vapor deposition in multiwafer furnaces

Journal of the Electrochemical Society

Volumn 144, Issue 4, 1997, Pages 1399-1410

  Griffiths, Stewart K ^a   Nilson, Robert H ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; LAGRANGE MULTIPLIERS; NUCLEATION; OPTIMIZATION; SILICON WAFERS; TRANSPORT PROPERTIES;

DEPOSITION RATE; DEPOSITION UNIFORMITY; OPTIMUM PRESSURE; OPTIMUM TEMPERATURE; PARTICLE NUCLEATION;

CHEMICAL VAPOR DEPOSITION;

EID: 0031122458     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837602     Document Type: Article

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