Chemical microimaging and microspectroscopy of surfaces with a photoemission microscope

Surface Science

Volumn 377-379, Issue , 1997, Pages 1106-1111

  Fecher, G H ^a   Hwu, Y ^b   Swiech, W ^a  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b INSTITUTE OF PHYSICS   (Taiwan)

Author keywords

Amorphous thin films; Copper; Copper oxides; Electron microscopy; Photoemission; Superconducting films; Surface structure, morphology, roughness, and topography; X ray absorption spectroscopy; Yttrium

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; COPPER; COPPER OXIDES; ELECTRON MICROSCOPY; MICROSTRUCTURE; PHOTOEMISSION; SUPERCONDUCTING FILMS; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; X RAY SPECTROSCOPY; YTTRIUM;

MICROIMAGING; PHOTOEMISSION ELECTRON MICROSCOPY (PEEM); SPECTROMICROSCOPY; X RAY SYNCHROTRON RADIATION;

SURFACES;

EID: 0031121801     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01558-0     Document Type: Article

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