Thin film silicon on insulator: An enabling technology

Semiconductor International

Volumn 20, Issue 4, 1997, Pages 67-74

  Alles, Michael ^a   Wilson, Syd ^a  

^a Ibis Technology Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; INTEGRATED CIRCUIT LAYOUT; ION IMPLANTATION; MICROELECTRONIC PROCESSING; SUBSTRATES; THIN FILMS;

SEPARATION BY IMPLANTATION OF OXYGEN (SIMOX); WAFER BONDING;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0031121025     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)