Relaxation of UV photon-stimulated field electron emission from particulate-based emission regimes

Surface Science

Volumn 376, Issue 1-3, 1997, Pages 411-417

  Xu, N S ^a   Latham, R V ^a  

^a ASTON UNIVERSITY   (United Kingdom)

Author keywords

Carbon; Electron emission; Field emission microscopy; Metallic surfaces; Photoelectron emission; Photoemission; Polycrystalline surfaces

Indexed keywords

CHEMICAL RELAXATION; CRYSTAL MICROSTRUCTURE; FIELD EMISSION MICROSCOPES; PHOTOEMISSION; PHOTONS; POLYCRYSTALLINE MATERIALS; SURFACE PHENOMENA; ULTRAVIOLET RADIATION;

METALLIC SURFACES;

ELECTRON EMISSION;

EID: 0031120752     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01329-5     Document Type: Article

References (12)

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12. K. Seeger, Semiconductor Physics (Springer, New York, 1973) ch. 12.