Influence of AlN protective film thickness on the hardness and electrophotographic properties of organic photoconductors

Journal of Electronic Materials

Volumn 26, Issue 4, 1997, Pages 387-390

  Miao, X S ^a   Chan, Y C ^a   Wong, C K H ^a   Webb, D P ^a   Lam, Y W ^a   Leung, K M ^a   Chiu, D S ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

AlN film; Electrophotographic properties; Microhardness; Organic photoconductor

Indexed keywords

HARDNESS; MAGNETRON SPUTTERING; OPTIMIZATION; ORGANIC COATINGS; PROTECTIVE COATINGS;

ALUMINUM NITRIDE; ELECTROPHOTOGRAPHIC PROPERTIES;

PHOTOCONDUCTING MATERIALS;

EID: 0031119504     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-997-0107-7     Document Type: Article

References (8)

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