Industrial metalorganic chemical vapor deposition technology for the growth of YBa2Cu3O7-a

Journal of Alloys and Compounds

Volumn 251, Issue 1-2, 1997, Pages 360-365

  Schulte, B ^a   Richards, B C ^b   Cook, S L ^b  

^a AIXTRON AG   (Germany)

^b Innospec Limited   (United Kingdom)

Author keywords

HTS films; MOCVD

Indexed keywords

CONTAMINATION; CRYSTAL DEFECTS; FILM GROWTH; FLUORINE; HIGH TEMPERATURE SUPERCONDUCTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; OXIDE SUPERCONDUCTORS; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; SUPERCONDUCTIVITY; YTTRIUM COMPOUNDS;

YTTRIUM BARIUM COPPER OXIDE;

SUPERCONDUCTING FILMS;

EID: 0031119308     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(96)02690-4     Document Type: Article

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