Surface characterization of excimer laser induced deposition of W on GaAs from WF 6 and H 2

Applied Surface Science

Volumn 108, Issue 4, 1997, Pages 417-424

  Tabbal, Malek ^b   Izquierdo, Ricardo ^a   Meunier, Michel ^a   Pépin, Corinne ^a   Yelon, Arthur ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; FLUORINE COMPOUNDS; HYDROGEN; LASER APPLICATIONS; NUCLEATION; SEMICONDUCTING GALLIUM ARSENIDE; SUBSTRATES; SURFACE PROPERTIES; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINATION; GALLIUM FLUORIDE; TUNGSTEN FLUORIDE;

METALLIC FILMS;

EID: 0031118782     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00691-5     Document Type: Article

References (38)

1. S.P. Kwok, J. Vac. Sci. Technol. B 4 (1986) 1383.
2. J.Y. Josefowicz and D.B. Rensch, J. Vac. Sci. Technol. B 5 (1987) 1707.
3. K.M. Yu, S.K. Cheung, T. Sands, J.M. Jaklevic, N.M. Cheung and E.E. Haller, J. Appl. Phys. 61 (1986) 3235.
4. S. Takatani, N. Matsuoka, J. Shigeta, N. Hashimoto et H. Nakashima, J. Appl. Phys. 61 (1987) 220.
5. S.C. Park, J.S. Lee, J.Y. Kang and J.Y. Lee, Appl. Phys. Lett. 59 (1991) 1767.
6. K.M. Yu, PhD thesis, University of California at Berkeley, 1987.
7. A.K. Sinha, T.E. Smith, T.T. Sheng and N.N. Axelrod, J. Vac. Sci. Technol. 10 (1973) 436.
8. S. Iwata, N. Yamamoto, N. Kobayashi, T. Tereda and T. Mizutani, J. Vac. Sci. Technol. 31 (1984) 1174.
9. R.S. Wagner, A.K. Sinha, T.T. Sheng, H.J. Levinstein and F.B. Alexander, J. Vac. Sci. Technol. 11 (1974) 582.
10. Y. Pauleau, Thin Solid Films 122 (1984) 234.
11. Z. Xu, T. Kosigu, K. Gamo and S. Namba, Jpn. J. Appl. Phys. 29 (1990) L23.
12. J. Wood, Appl. Surf. Sci. 38 (1989) 397.
13. S. Takahashi, M. Itoh, M. Akiyama and K. Kaminishi, Inst. Phys. Conf. Ser. 74 (1985) 509.
14. E.M. Geake and M. Middleton, Vacuum 38 (1988) 943.
15. A.J.P. Van Maaren, PhD Thesis, Utrecht University, 1991.
16. R.L. Krans, PhD Thesis, Utrecht University, 1991.
17. A. Lecours, R. Izquierdo, M. Tabbal, M. Meunier and A. Yelon, J. Vac. Sci. Technol. B 11 (1993) 51.
18. A. Katz, A. Feingold, S. Nakahara and S.J. Pearton, Appl. Phys. Lett. 61 (1992) 525.
19. Y.T. Kim, C.W. Lee, C.W. Man, J.S. Hong and S.-K. Min, Appl. Phys. Lett. 61 (1992) 1205.
20. A.J.P. Van Maaren, W.C. Sinke and J. Flicstein, J. Appl. Phys. 73 (1993) 1981.
21. A.J.P. Van Maaren, W.C. Sinke, J. Appl. Phys. 73 (1993) 1989.
22. M. Meunier, M. Tabbal, M. Suys, R. Izquierdo, A. Yelon, E. Sacher and S. Poulin, SPIE Proc. 2045 (1993) 84.
23. A. Lecours, MScA Thesis, École Polytechnique of Montréal, 1991.
24. Technical document: XPS atomic sensitivity factors for the VG Scientific Escalab Mk II, (VG Scientific, East Sussex, 1986).
25. C.F. Yu, M.T. Schmidt, D.V. Podlesnik and R.M. Osgood, Mat. Res. Soc. Symp. Proc. 75 (1987) 251.
26. C.D. Thurmond, G.P. Schwartz, G.W. Kammlott and B. Schwartz, J. Electrochem. Soc. 127 (1980) 1366.
27. W. Mokwa, D. Kohl and G. Heiland, Phys. Rev. B 29 (1984) 6079.
28. G. Herzberg, Molecular Spectra and Molecular Structure, I. Spectra of Diatomic Molecules (Van Nostrand Reinhold, New York, 1950) p. 340.
29. L. Ley, R.A. Pollack, F.R. McFeely, S.P. Kowalczyk and D.A. Shirley, Phys. Rev. B 9 (1974) 600.
30. P. Alnot, J. Olivier, F. Wyczisk and R. Joubard, J. Electrochem. Soc. 136 (1989) 2361.
31. M. Tabbal, A. Lecours, R. Izquierdo, M. Meunier and A. Yelon, Mater. Res. Soc. Symp. Proc. 236 (1992) 127.
32. M. Tabbal, Ph.D. Thesis, École Polytechnique de Montréal, 1994.
33. A. Lecours, M. Meunier and R. Izquierdo, Appl. Surf. Sci. 54 (1992) 60.
34. K.N. Tanner and A.B.F. Duncan, J. Am. Chem. Soc. 73 (1951) 1164.
35. R. McDiarmid, J. Chem. Phys. 61 (1975) 3333.
36. D.L. Hildenbrand, J. Chem. Phys. 51 (1975) 3074.
37. K.L. Seaward, N.J. Moll, D.J. Coulman and W.F. Stickle, J. Appl. Phys. 61 (1987) 2358.
38. R.C. Weast ed., CRC Handbook of Chemistry and Physics, 70th Edn. (CRC Press, New York, 1989-90).