On the use of surfactants in the electrochemical preparation of porous silicon

Thin Solid Films

Volumn 297, Issue 1-2, 1997, Pages 18-21

  Sotgiu, Giovanni ^a   Schirone, Luigi ^a   Rallo, Franco ^a  

^a ROMA TRE UNIVERSITY   (Italy)

Author keywords

Luminescence; Raman spectroscopy; Surface tension

Indexed keywords

ANODIC OXIDATION; CRITICAL MICELLE CONCENTRATION; ELECTROCHEMISTRY; HYDROFLUORIC ACID; PHOTOLUMINESCENCE; POROUS SILICON; RAMAN SPECTROSCOPY; SILICON WAFERS; SOLUTIONS; SURFACE ACTIVE AGENTS; SURFACE TENSION; THIN FILMS;

ELECTROCHEMICAL ANODIZATION;

FILM PREPARATION;

EID: 0031118721     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09435-7     Document Type: Article

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