Water vapour adsorption on the Si(111)-(7 × 7) surface

Surface Science

Volumn 377-379, Issue , 1997, Pages 639-643

  Zaibi M A ^a,b   Lacharme, J P ^a   Sebenne C A ^a  

^a CNRS   (France)

^b UNIVERSITY OF TUNIS   (Tunisia)

Author keywords

Silicon; Surface chemical reaction; Water

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; DISSOCIATION; ELECTRIC PROPERTIES; ELECTRON ENERGY LOSS SPECTROSCOPY; GAS ADSORPTION; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR STRUCTURE; OXYGEN; PHOTOEMISSION; STEAM; SURFACE PHENOMENA;

DANGLING BONDS; PHOTOEMISSION YIELD SPECTROSCOPY (PYS);

SEMICONDUCTING SILICON;

EID: 0031117693     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01481-1     Document Type: Article

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