SCOPUS 정보 검색 플랫폼

Surface Science

Volumn 377-379, Issue , 1997, Pages 988-991

Growth of hcp Cu on W(100)

(4) Wormeester, H a,b Kiene, M E a,c Huger E a Bauer, E a,d

a CLAUSTHAL UNIVERSITY OF TECHNOLOGY (Germany)

b UNIVERSITY OF TWENTE (Netherlands)

c UNIVERSITY OF KIEL (Germany)

d ARIZONA STATE UNIVERSITY (United States)

Author keywords

Copper; Epitaxy; Metallic films; Reflection high energy electron diffraction (RHEED); Single crystal epitaxy; Tungsten; Visible and ultraviolet photoelectron spectroscopy

Indexed keywords

COPPER; ELECTRONIC STRUCTURE; EPITAXIAL GROWTH; PHOTOELECTRON SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; SURFACE STRUCTURE; THERMAL EFFECTS; THIN FILMS; TUNGSTEN; ULTRAVIOLET SPECTROSCOPY;

SINGLE CRYSTAL EPITAXY; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; VISIBLE PHOTOELECTRON SPECTROSCOPY;

METALLIC FILMS;

EID: 0031117541 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(96)01556-7 Document Type: Article

Times cited : (14)

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