The pseudo-ordered structure in light emitting porous and nanocrystalline silicon films

Applied Physics Letters

Volumn 70, Issue 17, 1997, Pages 2265-2267

  Wang, L C ^a,b   Liu, X N ^a   Yan, F ^a   Bao, X M ^a   Feng, D ^a   Rainforth, W M ^b  

^a NANJING UNIVERSITY   (China)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIGITAL SIGNAL PROCESSING; ELECTRON DIFFRACTION; FOURIER TRANSFORMS; IMAGE PROCESSING; LIGHT EMISSION; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; POROUS MATERIALS; POROUS SILICON; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DIGITAL IMAGE PROCESSING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PSEUDO ORDERED STRUCTURE;

SEMICONDUCTING SILICON;

EID: 0031117529     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118834     Document Type: Article

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