Synthesis of boron nitride by remote plasma enhanced chemical vapor deposition

Vide: Science, Technique et Applications

Volumn 53, Issue 284 SUPPL. 1, 1997, Pages 289-292

  Pierson, J F ^a   Belmonte, T ^a   Czerwiec, T ^a   Michel, H ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; OXIDATION; PLASMA APPLICATIONS; QUARTZ; SUBSTRATES; SYNTHESIS (CHEMICAL); ZIRCONIUM ALLOYS;

BORON NITRIDE; REMOTE PLASMA ENHANCE CHEMICAL VAPOR DEPOSITION (RPECVD);

BORON COMPOUNDS;

EID: 0031117345     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. R.R. Wills, Int. J. High Technology Ceramics, 1 (1985) 139-153
2. M. Okamoto, H. Yokayama, Y. Osaka, Japanese Journal of applied Physics, 29 5 (1990) 930-933
3. L. Vel, G. Demazeau, J. Etourneau, Materials Science and Engineering, B10 (1991) 149-164
4. S.S. Batsanov, G.E. Blokhina, A.A. Deribas, J. Struct. Chem, 6 (1965) 209-213
5. S.B. Hyder, T.O. Yep, J. Electrochem. Soc., 123 11 (1976) 1721-1724
6. T.H. Yuzurika, W.E. Mlynko, D.W. Hess, J. Vac. Sci. Technol. A, 3 6 (1985) 2135-2140
7. W. Schomlla, H.L. Hartnagel, Solid State Electronics, 26 10 (1983) 931-939
8. T. Matsuda, N. Uno, H. Nakae, T. Hirai, J. Mat. Sci., 21 (1986) 649-658