Silicide formation in thin film Pt-Si(111) structure by USXES data

Thin Solid Films

Volumn 298, Issue 1-2, 1997, Pages 135-137

  Domashevskaya, E P ^a   Yurakov, Yu A ^a   Kashkarov, V M ^a  

^a VORONEZH STATE UNIVERSITY   (Russian Federation)

Author keywords

Solid phase interaction; Thin film silicides; Ultra soft X ray spectroscopy; Vacuum annealing

Indexed keywords

ANNEALING; EMISSION SPECTROSCOPY; PLATINUM COMPOUNDS; RADIATION EFFECTS; SURFACE STRUCTURE; THIN FILMS; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS; X RAY SPECTROSCOPY;

SOLID PHASE INTERACTIONS; ULTRASOFT X RAY EMISSION SPECTROSCOPY (USXES); VACUUM ANNEALING;

METALLIC FILMS;

EID: 0031117216     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09209-7     Document Type: Article

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