Conductive LaNiO3 electrode grown by pulsed laser ablation on Si substrate

Journal of Materials Research

Volumn 12, Issue 4, 1997, Pages 931-935

  Sun, Li ^a   Yu, Tao ^a   Chen, Yan Feng ^a   Zhou, Jun ^a   Ming, Nai Ben ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; LANTHANUM COMPOUNDS; LASER ABLATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY;

ELECTRON PROBE MICROANALYZER (EPMA); PULSED LASER ABLATION (PLA);

CONDUCTIVE FILMS;

EID: 0031117133     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0133     Document Type: Article

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