Characterisation of oxygen plasma-modified mica surfaces using XPS and AFM

Applied Surface Science

Volumn 108, Issue 3, 1997, Pages 319-332

  Liu, Zhi Hui ^a   Brown, Norman M D ^a   McKinley, Archibald ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANISOTROPY; ATOMIC FORCE MICROSCOPY; ATOMS; CRYSTAL DEFECTS; CRYSTAL LATTICES; MICROSTRUCTURE; MORPHOLOGY; OXYGEN; PLASMA ETCHING; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

ETCHING TIME; LATTICE ANISOTROPY; OXYGEN PRESSURE; PLASMA DISCHARGE; TOPOGRAPHY;

SURFACES;

EID: 0031103481     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00683-6     Document Type: Article

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