|
Volumn 36, Issue 3 A, 1997, Pages
|
Electrolysis by using diamond thin film electrodes
a a a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ANODES;
BORON;
CHEMICAL VAPOR DEPOSITION;
CURRENT DENSITY;
ELECTROLYSIS;
OZONE;
POLARIZATION;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
SUBSTRATES;
SULFURIC ACID;
THIN FILMS;
DIAMOND THIN FILM ELECTRODES;
HOT FILAMENT CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
|
EID: 0031100965
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.l260 Document Type: Article |
Times cited : (21)
|
References (6)
|