An advanced shallow simox/cmos technology for high performance portable systems

IEICE Transactions on Electronics

Volumn E80-C, Issue 3, 1997, Pages 407-415

  Adan, Alberto O ^a  

^a SHARP CORPORATION   (Japan)

Author keywords

CMOS; High speed; Low power; SIMOX; SOI

Indexed keywords

DIELECTRIC MATERIALS; ETCHING; ION IMPLANTATION; LITHOGRAPHY; MOSFET DEVICES; OXIDATION; OXIDES; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; THIN FILMS;

CHANNEL DRAIN PROFILE ENGINEERING; SHORT CHANNEL EFFECT; THERMAL OXIDATION; THRESHOLD VOLTAGE; WET ETCHING;

CMOS INTEGRATED CIRCUITS;

EID: 0031100010     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (20)

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