Attenuated phase shift mask materials for 248- and 193-nm lithography

Microlithography World

Volumn 6, Issue 2, 1997, Pages

  Smith, Bruce W ^a   Butt, Shahid ^a   Alam, Zulfiqar ^a  

^a Kate Gleason College of Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; LITHOGRAPHY; PHASE SHIFT;

ATTENUATED PHASE SHIFT MASK (APSM);

MASKS;

EID: 0031099260     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)