XPS measurement for the elements in the interface between oxygen ion irradiated ZrO2-Y2O3 films and iron substrate

Physica Status Solidi (A) Applied Research

Volumn 160, Issue 1, 1997, Pages 145-150

  Zhang, H L ^a   Wang, D Z ^a   Yang, B ^a   Huang, N K ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); ION BOMBARDMENT; IRON; MAGNETRON SPUTTERING; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM COMPOUNDS; ZIRCONIA;

RADIOFREQUENCY MAGNETRON SPUTTER DEPOSITION;

THIN FILMS;

EID: 0031098945     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(199703)160:1<145::AID-PSSA145>3.0.CO;2-5     Document Type: Article

References (9)

1. J. E. E. BAGLIN, Nuclear Instrum. and Methods B 65, 119 (1992).
2. N. K. HUANG, J. Mater. Sci. Letters 11, 681 (1992).
3. N. PANAGOPOULOS, Thin Solid Films 137, 135 (1986).
4. D. MAJUMDER and D. CHATTERJEE, J. Appl. Phys. 70, 988 (1991).
5. D. MAUMDER, Appl. Surface Sci. 68, 189 (1993).
6. N. K. HUANG, H. KEYRANDISH, and J. S. COLLIGON, Mater. Res. Bull. 27, 239 (1992).
7. G. M. INGO and G. MARLETTA, Nuclear Instrum. and Methods B 116, 440 (1996).
8. P. E. WEST and P. M. GEORGE, J. Vacuum Sci. Teehnol. A 5, 1124 (1987).
9. N. K. HUANG, Z. R. FENG, and D. Z. WANG, Thin Solid Films 221, 9 (1992).