Kinetics of enhanced thermal oxidation of silicon carbide using amorphization by ion implantation

Journal of the Electrochemical Society

Volumn 144, Issue 3, 1997, Pages 1135-1137

  Alok, Dev ^a   Boliga, B Jayant ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; REACTION KINETICS; THERMOOXIDATION;

DRY OXIDATION; LINEAR PARABOLIC GROWTH; MONOCRYSTALLINE REGIONS;

SILICON CARBIDE;

EID: 0031098546     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837545     Document Type: Article

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