Substrate bias effect of the activated reactive evaporation processed β-SiC thin films

Surface and Coatings Technology

Volumn 90, Issue 1-2, 1997, Pages 35-41

  Cha, Y H C ^a   Kim, P G ^a   Doerr, H J ^a   Bunshah, R F ^a,b  

^a University of California   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Activated reactive evaporation; Substrate bias effect; SiC thin films

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; EVAPORATION; FILM PREPARATION; HALL EFFECT; HARDNESS; SILICON CARBIDE; SUBSTRATES; THERMOCOUPLES;

ACTIVATED REACTIVE EVAPORATION (ARE); KNOOP HARDNESS; SUBSTRATE BIAS EFFECTS; VICKERS HARDNESS;

THIN FILMS;

EID: 0031098093     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03081-2     Document Type: Article

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