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Journal of Materials Science Letters

Volumn 16, Issue 6, 1997, Pages 417-419

In situ development of aluminides on titanium

(3) Raja, V S a Jeevanandam, S a Bhatgadde, L G b

a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY (India)

b Advanced Center For Research in Electronics Mumbai (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; DIFFERENTIAL SCANNING CALORIMETRY; DUCTILITY; ELECTROLESS PLATING; HEAT TREATMENT; HYDROGEN EMBRITTLEMENT; NICKEL; PICKLING; SPUTTER DEPOSITION; SURFACE TREATMENT; TITANIUM;

ALUMINIDES; ELECTROLESS BATH; ELECTROLESS COATING; HIGH TEMPERATURE PACK CEMENTATION PROCESSES;

ALUMINUM ALLOYS;

EID: 0031097639 PISSN: 02618028 EISSN: None Source Type: Journal
DOI: 10.1023/A:1018527318592 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.