Quantitative measurement of the resist heating in a variable shaped electron lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 311-315

  Babin, Sergey ^a,c   Hudek, Peter ^b   Kostic, Ivan ^b  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^b INSTITUTE OF CHEMISTRY   (Slovakia)

^c Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; HEATING; MEASUREMENT ERRORS; PHOTOSENSITIVITY; SUBSTRATES; TEMPERATURE; THERMAL EFFECTS;

FLASH SIZE; FLASHES; RESIST HEATING; TEMPERATURE RISE;

PHOTORESISTS;

EID: 0031097495     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589312     Document Type: Article

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