Sb on Si(111) studied by branching-ratio photoelectron holography

Surface Science

Volumn 374, Issue 1-3, 1997, Pages 345-349

  Luh, D A ^b   Sieger, M T ^a   Miller, T ^b   Chiang, T C ^b  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b NONE

Author keywords

Adatoms; Antimony; Silicon; Soft X ray photoelectron spectroscopy; Surface structure, morphology, roughness, and topography

Indexed keywords

ADSORPTION; ANTIMONY; ATOMS; CHEMICAL BONDS; ELECTRONS; HOLOGRAPHY; MATHEMATICAL MODELS; MORPHOLOGY; PHOTOEMISSION; SILICON; SURFACE STRUCTURE;

BRANCHING RATIO PHOTOELECTRON HOLOGRAPHY; SOFT X RAY PHOTOELECTRON SPECTROSCOPY; TRIMER MODEL;

SURFACES;

EID: 0031097383     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01225-3     Document Type: Article

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