Projection electron-beam lithography: SCALPEL

Microlithography World

Volumn 6, Issue 2, 1997, Pages 15-19

  Liddle, J Alexander ^a   Harriott, Lloyd R ^a   Waskiewicz, Warren K ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PROJECTION SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE;

PROJECTION ELECTRON BEAM LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031096932     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)