Depth and width measurement simulation of semiconductor trench by optical wave irradiation

IEEE Transactions on Magnetics

Volumn 33, Issue 2 PART 2, 1997, Pages 1428-1431

  Shirasaki, Hirokimi ^a  

^a TAMAGAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY ELEMENT METHOD; ELECTROMAGNETIC WAVE SCATTERING; LIGHT POLARIZATION; MATHEMATICAL MODELS; PERMITTIVITY;

SEMICONDUCTOR SQUARE TRENCH; TWO DIMENSIONAL GAUSSIAN BEAM IRRADIATION;

SEMICONDUCTOR DEVICES;

EID: 0031096397     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.582525     Document Type: Article

References (12)

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