Growth modes and electronic properties of copper ultra-thin films on a V(100) surface

Surface Science

Volumn 374, Issue 1-3, 1997, Pages 51-60

  Valla, T ^a   Pervan, P ^a   Milun, M ^a   Wandelt, K ^b  

^a INSTITUTE OF PHYSICS   (Croatia)

^b Inst F Phys Und Theor Chem D   (Germany)

Author keywords

Angle resolved photoemission; Copper; Growth; Metallic films; Thermal desorption spectroscopy; Vanadium; Work function measurements; X ray photoelectron spectroscopy

Indexed keywords

ATOMS; COPPER; DEPOSITION; ELECTRONIC PROPERTIES; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; PHOTOEMISSION; SPECTROSCOPY; SURFACES; VANADIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE RESOLVED PHOTOEMISSION; THERMAL DESORPTION SPECTROSCOPY; WORK FUNCTION MEASUREMENTS;

METALLIC FILMS;

EID: 0031094815     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01220-4     Document Type: Article

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