A numerical study of the effects of electromagnetic stirring on the distributions of temperature and oxygen concentration in silicon double-crucible Czochralski processing

Journal of the Electrochemical Society

Volumn 144, Issue 2, 1997, Pages 764-772

  Ono, Naoki ^a,c   Trapaga, Gerardo ^b  

^a MITSUBISHI MATERIALS CORPORATION   (Japan)

^b USA   (United States)

^c ELECTROCHEMICAL SOCIETY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; OXYGEN; SEMICONDUCTING SILICON; TEMPERATURE;

DOUBLE CRUCIBLE; ELECTROMAGNETIC STIRRING;

CRYSTAL GROWTH FROM MELT;

EID: 0031079369     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837482     Document Type: Article

References (12)

1. M. Kida, Y. Arai, N. Ono, and K. Sahira, Abstract 232, p. 343, The Electrochemical Society Meeting Abstracts, Vol. 89-1, Los Angeles, CA, May 7-12, 1989.
2. N. Ono, G. Trapaga, and J. Szekely, Abstract 470, p. 740, The Electrochemical Society Meeting Abstracts, Vol. 94-2, Miami Beach, FL, October 9-14, 1994.
3. J. Szekely and C. W. Chang, Ironmaking Steelmaking, 4, 190 (1977).
4. E. Tarapore and J. Evans, Metall. Trans. B, 7B, 343 (1976).
5. J. L. Meyer, N. El-Kaddah, J. Szekely, C. Vives, and R. Ricou, ibid., 18B, 529 (1987).
6. S. Kobayashi, S. Miyahara, T. Fujiwara, T. Kubo, and H. Fujiwara, J. Cryst. Growth, 109, 149 (1991).
7. N. Ono, M. Kida, Y. Arai, and K. Sahira, This Journal, 140, 2106 (1993).
8. B. E. Launder and D. B. Spalding, Comput. Methods Appl. Mechanics Eng., 3, 269 (1974).
9. H. Hirata and K. Hoshikawa, J. Cryst. Growth, 106, 657 (1990).
10. W. E. Langlois, K. M. Kim, and J. S. Walker, ibid., 126, 352 (1993).
11. J. R. Carruthers and K. Nassau, J. Appl. Phys., 39, 5205 (1968).
12. N. Ono, M. Kida, Y. Arai, and K. Sahira, This Journal, 140, 2101 (1993).