Blister formation in silicon films during ion beam assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 122, Issue 2, 1997, Pages 229-232

  Liu, C H ^a   He, Yuan Jin ^a   Li, Wen Zhi ^a   Li, Heng De ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILMS; ION BOMBARDMENT; SEMICONDUCTOR MATERIALS; SILICON;

BLISTER FORMATION; ION BEAM ASSISTED DEPOSITION; SILICON FILMS;

ION BEAMS;

EID: 0031078960     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00711-2     Document Type: Article

References (15)

1. J. Linnros, G. Holmen and B. Svensson, Phys. Rev. B 32 (1985) 2270.
2. J. Linnros, R.G. Elliman and W.L. Brown, J. Mater. Res. 3 (1988) 1208.
3. B. Zeroual and G. Carter, Vacuum 42 (1991) 525.
4. P.G. Le Comber, J. Non-Cryst. Solids 115 (1989) 1.
5. H.R. Khan, H. Frey and H. Schoellkopf, Surf. Coat. Technol. 67 (1994) 79.
6. He Xiaoming, Li Hengde and Li Wenzhi, Proc. Int. Conf. on Surface Science and Engineering, May 15-19, 1995, Beijing (International Academic Publisher, Beijing, 1995) p. 15.
7. C. Weissmantel, Thin Solid Films 13 (1972) 359.
8. P.B. Johnson and D.J. Mazey, J. Nucl. Mater. 93 and 94 (1980) 721.
9. W. Jager and J. Roth, J. Nucl. Mater. 93 and 94 (1980) 756.
10. W. Bauer, J. Nucl. Mater. 76 and 77 (1978) 3.
11. M.S. Aida and R. Bachiri, J. Non-Cryst. Solids 189 (1995) 167.
12. M. Akani, R. Suryanarayan and G. Brun, J. Appl. Phys. 60 (1986) 457.
13. J.C. Phillips, J. Non-Cryst. Solids 34 (1987) 153.
14. P. Steinhardt, R. Alben and D. Weaire, J. Non-Cryst. Solids 15 (1973) 199.
15. D.C. Craigen and D.E. Brodie, J. Phys.: Condens. Matter 4 (1992) 9843.