High-resolution cross-sectional imaging of MOSFET's by scanning resistance microscopy

IEEE Electron Device Letters

Volumn 18, Issue 2, 1997, Pages 71-73

  Nxumalo, J N ^a   Shimizu, D T ^a   Thomson, D J ^a   Simard Normadin, M ^b  

^a UNIVERSITY OF MANITOBA   (Canada)

^b NORTEL NETWORKS   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE MEASUREMENT; IMAGING TECHNIQUES; POLISHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING BORON; SEMICONDUCTING DIAMONDS; SEMICONDUCTOR DOPING; SURFACES;

CONDUCTING DIAMOND TIPS; SCANNING CAPACITANCE MICROSCOPE; SCANNING RESISTANCE MICROSCOPY; SEMICONDUCTING SURFACE;

MOSFET DEVICES;

EID: 0031078787     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.553048     Document Type: Article

References (13)

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